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PVD Deposition Machine / Sputtering / Thin-film / With Rotating Cathodes

PVD deposition machine / sputtering / thin-film / with rotating cathodes

1 870 x 1 320 x 2 155 mm | 20 kW | Π80

INO Group

PVD deposition machine / sputtering / thin-film / with rotating cathodes
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  • Method:

    PVD

  • Technology:

    sputtering

  • Deposition type:

    thin-film

  • Other characteristics:

    with rotating cathodes

General Information
Compact hardcoating unit
Based on PLATIT LARC® technology (LAteral Rotating Cathodes)
Coating on tool steels (TS) above 200°C, high speed steels (HSS) 350 - 500°C and on tungsten carbide (WC) between 350 - 700°C
With Virtual and Tube shutter®
Loading Capacities

Hard Coatings
Standard: TiN, TiAlN, AlTiN, nACo®
Optional: TiCN-MP, TiAlCN, GRADVIC®, ZrN, CrN, CROMVIC®, CROMVIC2® , CrTiN, AlCrN, AlTiCrN, Fi-Vic®, Fi-TIVic®, nACVIc, Ti2N, CROMTIVIC®, CROMTIVIC2®, nACRo®
Monolayers, Multilayers, nanogradients, nanolayers, nanocomposities, DLC and their combinations

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